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    New AFRL lab capability poised to change the face of high-power electronics [Image 2 of 2]

    New AFRL lab capability poised to change the face of high-power electronics

    WRIGHT-PATTERSON AIR FORCE BASE, OH, UNITED STATES

    02.04.2019

    Photo by Holly H Jordan 

    Air Force Research Laboratory

    AFRL Materials Researcher Dr. Shin Mou shows off the laboratory’s new Molecular Beam Epitaxy chamber, a highly-specialized piece of equipment enabling the growth of semiconducting materials for a new breed of lighter, smaller, more agile electronics. (U.S. Air Force Photo/Adrienne Kreighbaum)

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    IMAGE INFO

    Date Taken: 02.04.2019
    Date Posted: 04.01.2019 13:55
    Photo ID: 5227146
    VIRIN: 190312-F-FX606-001
    Resolution: 6000x4000
    Size: 9.89 MB
    Location: WRIGHT-PATTERSON AIR FORCE BASE, OH, US

    Web Views: 61
    Downloads: 10

    PUBLIC DOMAIN